The comparison of multi-stepping algorithms for real-time thickness measurement of transparent thin films using polarization settings
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Publication Details
Author list: Abdullahi Usman, Yuttapong Jiraraksopakun, Rapeepan Kaewon, Chutchai Pawong and Apichai Bhatranand
Publisher: IOP Publishing
Publication year: 2022
Journal acronym: Laser Phys.
Volume number: 32
Issue number: 12
Start page: 125401
ISSN: 1054-660X
eISSN: 1555-6611
URL: https://iopscience.iop.org/article/10.1088/1555-6611/aca026
Languages: English-United States (EN-US)
Abstract
This paper presents the comparison of three-, four- and five-step techniques for measuring
transparent thin-film thickness of Ta2O5 and WO3 deposited on BK-7 substrates. The Sagnac
interferometer was modified with phase shifting approach for the determination of thin-film
thickness. The input light beam was split into reference and testing beams. Before the output
light reaching the balanced photodetectors, the real-time signal detection was performed to
obtain the output intensities of both beams using three-, four-, and five-polarization settings of
an analyzer. The thicknesses could then be efficiently translated from the measured intensities.
Thicknesses from three-, four- and five-stepping algorithms were compared with ones from the
conventional FE-SEM measurement, and it was discovered that the former performed better
with less errors. The findings show that the phase-shifting technique using three-polarization
settings is more suitable for the thickness measurement of the transparent thin film.
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