Corrosion Resistance of Tensioned DLC Film-Coated Ti-6Al-4V Substrate Prepared by PBII Method

The elements added diamond-like carbon films (silicon and nitrogen) fabricated from C2H2, C2H2:TMS, and C2H2:TMS:N2 mixtures were used to compare and study the effects of element contents on the deposition and corrosion resistance of DLC, Si-DLC and Si-N-DLC films prepared by plasma-based ion implantation (PBII). All of the films were deposited with a film thickness of 500 nm on a titanium Ti-6Al-4V substrate. All coated substrates were tensioned with 3%, 5% and 7% elongation. The adhesion strength of the films to sample substrates were measured by the scratch tester. The surface morphologies of the film after tensioned were measured by Scanning Electron Microscope (SEM). The corrosion resistance of films after tensioned was conducted by potentiodynamic polarization experiments in Ringer’s solution.