Highly stable and reusable ZrHfN nanorod films: An alternative SERS substrate via reactive co-sputtering with OAD technique

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Author listChaikeeree T.; Kasayapanand N.; Mungkung N.; Phae-ngam W.; Botta R.; Lertvanithphol T.; Dhanasiwawong K.; Nakajima H.; Arunrungrusmi S.; Bodinthitikul N.; Klamchuen A.; Horprathum M.

PublisherElsevier

Publication year2025

JournalApplied Surface Science (0169-4332)

Volume number689

ISSN0169-4332

eISSN1873-5584

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85216118398&doi=10.1016%2fj.apsusc.2025.162500&partnerID=40&md5=ab6c31570d12a18a52e528bc0ab4f429

LanguagesEnglish-Great Britain (EN-GB)


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Abstract

Transition metal nitride nanostructures have garnered significant attention as promising alternative plasmonic sensing materials for surface-enhanced Raman scattering (SERS) substrates due to their low cost and favorable physical, chemical, and plasmonic properties. This work demonstrates the deposition and characterization of zirconium hafnium nitride (ZrHfN) nanorod films as an alternative SERS substrate. The ZrHfN nanorod films were prepared using closed-field dual-cathode DC unbalanced reactive magnetron sputtering with the oblique angle deposition (OAD) technique. The influence of the sputtering current of the Hf target was investigated and comprehensively characterized using FE-SEM, GIXRD, AFM, TEM-EDS mapping, XPS, and XAS. Using Rhodamine 6G (R6G) dye as the target analyte, the SERS performance of the ZrHfN nanorod films was evaluated. Our systematic investigation shows that the optimal ZrHfN nanorod films, prepared at a sputtering current of 800 mA for the Hf target, exhibited an enhancement factor of 9.07 × 105 with 4.87 %-RSD at 1512 cm−1. Moreover, the limit of detection for optimal ternary nitride SERS substrate was determined to be 1.88 × 10−7 M, with excellent reusability, long-term stability, and high-temperature resistance. Additionally, detecting trace levels of toxic paraquat herbicide was demonstrated, indicating potential for practical applications. © 2025 Elsevier B.V.


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Last updated on 2025-30-05 at 00:00