Influence of structural and electrical properties of ITO films on electrochromic Properties of WO3 films

Conference proceedings article

ผู้เขียน/บรรณาธิการ

กลุ่มสาขาการวิจัยเชิงกลยุทธ์

ไม่พบข้อมูลที่เกี่ยวข้อง

รายละเอียดสำหรับงานพิมพ์

รายชื่อผู้แต่ง: Aiempanakit K., Dumrongrattana S., Rakkwamsuk P.

ผู้เผยแพร่: Trans Tech Publications

ปีที่เผยแพร่ (ค.ศ.): 2008

Volume number: 55-57

หน้าแรก: 921

หน้าสุดท้าย: 924

จำนวนหน้า: 4

ISBN: 9780878493562

นอก: 1022-6680

URL: https://www.scopus.com/inward/record.uri?eid=2-s2.0-62949137194&partnerID=40&md5=b7c86c6b588ee51c8750bc2daf690f20

ภาษา: English-Great Britain (EN-GB)

บทคัดย่อ

Indium tin oxide (ITO) films had been deposited on glass substrate without substrate heating and then tungsten oxide (WO3) films were deposited on ITO films by DC magnetron sputtering. In this work, we present the annealing ambient effect of ITO substrate on electrochromic properties of WO3 films. The ITO films were annealing in air and in vacuum at 350ฐC before coating with WO3 films. The structural, optical, and electrical properties of ITO films for as-deposited, annealing in air and in vacuum were investigated by X-ray diffraction, UV-VIS-NIR. spectroscope and four point probe. The ITO films had a better crystallinity and lager grain size after annealing in air and in vacuum. The resistivity of ITO films increase with annealing in air, but decrease with annealing in vacuum. The WO3 films show difference surface morphology with higher grain size and surface roughness when coating on annealed ITO films in both cases. The electrochemical properties of film systems were characterized by cyclic voltammetry. The film systems of ITO plus WO3 showed that the charge capacity of ITO substrate annealing in vacuum was higher than the as-deposited ITO substrate and the ITO substrate annealing in air, respectively. This result corresponded to electrical conductivity of each ITO substrate. ฉ 2008 Trans Tech Publications, Switzerland.

คำสำคัญ

Annealing ambient, WO3