Photo-induced superhydrophilic TiO2 films deposited by DC reactive magnetron sputtering at room temperature

Conference proceedings article

ผู้เขียน/บรรณาธิการ

กลุ่มสาขาการวิจัยเชิงกลยุทธ์

ไม่พบข้อมูลที่เกี่ยวข้อง

รายละเอียดสำหรับงานพิมพ์

รายชื่อผู้แต่ง: Horprathum M., Chindaudom P., Patthanasettakul V., Rotbuathong S., Eiamchai P., Limsuwan P.

ผู้เผยแพร่: Trans Tech Publications

ปีที่เผยแพร่ (ค.ศ.): 2008

Volume number: 55-57

หน้าแรก: 441

หน้าสุดท้าย: 444

จำนวนหน้า: 4

ISBN: 9780878493562

นอก: 1022-6680

URL: https://www.scopus.com/inward/record.uri?eid=2-s2.0-62949087265&partnerID=40&md5=6bf991e5e3cfd0025343067d6b77dade

ภาษา: English-Great Britain (EN-GB)

บทคัดย่อ

Titanium dioxide (TiO2) thin films, 80-170 nm thick were deposited on unheated silicon wafers (100) and glass slides with controlled operating pressure in UHV dc sputtering system with a pressure control gate valve. The dependence of hydrophilic property of the films on the total sputtering pressure of mixed Ar and O2 gases (1-10 mTorr) was investigated. We found that hydrophilic activity as well as the structural and optical properties of the films were strongly related to the pressure maintained during the deposition. The TiO2 film structure and surface morphology were studied by X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM) and spectroscopic ellipsometry (SE). The optical constants of the TiO2 films was determined by SE. XRD showed that the films deposited between 1-5 mTorr had both anatase and rutile phase, but the rutile component reduced as the pressure increased. Only anatase peaks were obtained for the films deposited at pressure >5 mTorr. The AFM surface roughness decreased from 4.0 to 1.8 nm as the pressure increased from 1-10 mTorr. The contact angle measurement was used to determine the hydrophilicity of the films after exposed to UV light. ฉ 2008 Trans Tech Publications, Switzerland.

คำสำคัญ

Superhydrophilic