Investigation of surface properties on indium thin oxide films modified by MirroTron sputtering system

Conference proceedings article

Authors/Editors

NARONG MUNGKUNG

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Publication Details

Author list: Mungkung N., Yuji T., Nakabayashi K., Kataoka H., Suzaki Y., Toya H., Shibata H.

Publication year: 2010

Start page: 509

End page: 512

Number of pages: 4

ISBN: 9781424483655

ISSN: 1093-2941

eISSN: 1093-2941

URL: https://www.scopus.com/inward/record.uri?eid=2-s2.0-78650472747&doi=10.1109%2fDEIV.2010.5625759&partnerID=40&md5=1e0bbe18368afee4e6bc82fcb71a54d1

Languages: English-Great Britain (EN-GB)

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Abstract

Indium Tin Oxide (ITO) film is evaporated on the PEN film using MirrorTron Sputtering system, which is a new sputtering system enabling sputter deposition at a low temperature, separating a sputtering chamber and a deposition chamber. As a result, a uniform ITO thin-film deposition with a film thickness of 150 nm is enabled. This ITO thin-film is chemically analyzed using Focused ion beam and X-ray photoelectron spectroscopy. As a result, good thin-film condition is confirmed. ฉ2010 IEEE.

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