The effect of titanium current on structure and hardness of aluminium titanium nitride deposited by reactive unbalanced magnetron co-sputtering

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Author listBuranawong A., Witit-Anun N., Chaiyakun S., Pokaipisit A., Limsuwan P.

PublisherElsevier

Publication year2011

Volume number519

Issue number15

Start page4963

End page4968

Number of pages6

ISSN0040-6090

eISSN1879-2731

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-79957654931&doi=10.1016%2fj.tsf.2011.01.062&partnerID=40&md5=66e49b05769c4df2c8e0cf53f59a8e8f

LanguagesEnglish-Great Britain (EN-GB)


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Abstract

Nanocrystalline aluminium titanium nitride (AlTi3N) thin films were deposited on Si (100) wafer and grid substrates without external heating and biasing at room temperature by reactive unbalanced magnetron co-sputtering technique using pure individual titanium and aluminium targets. The effects of titanium current (ITi) on the structure and hardness of these films have been studied. The films were sputtered with Ar and N2 gases flow rate of 8 and 4 sccm, respectively. The sputtering current of the aluminium current (IAl) was kept at 600 mA and the sputtering current of titanium (ITi) was varied from 600 to 800 mA. The films were deposited for different deposition times ranging from 15 to 60 min. The deposited films were then characterized and analyzed by X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) and nanoindentation measurement. The results indicated that the modification of the crystal structure, surface morphology and microstructure were dependent on the deposition parameters. The XRD patterns show polycrystalline structure with preferred orientations in (112), (004) and (153) planes which agree with the standard structure of aluminium titanium nitride (AlTi3N) films. In addition, the structure of AlTi 3N was also confirmed by TEM. These results show that the films are composed of high Al content. The root mean square surface roughness and the average thicknesses were strongly influenced by Iti and deposition times. Cross section analysis by SEM showed dense and compact columnar morphology. The typical hardness of the films was approximately 26.24-30.37 GPa. Copyright ฉ 2011 Published by Elsevier B.V. All rights reserved.


Keywords

Aluminium titanium nitrideReactive magnetron co-sputteringTitanium current


Last updated on 2023-23-09 at 07:36