Structure and surface morphology of Cr-Zr-N thin films deposited by reactive DC magnetron sputtering

Conference proceedings article

ผู้เขียน/บรรณาธิการ

กลุ่มสาขาการวิจัยเชิงกลยุทธ์

ไม่พบข้อมูลที่เกี่ยวข้อง

รายละเอียดสำหรับงานพิมพ์

รายชื่อผู้แต่ง: Chantharangsi C., Denchitcharoen S., Chaiyakun S., Limsuwan P.

ผู้เผยแพร่: Elsevier

ปีที่เผยแพร่ (ค.ศ.): 2012

Volume number: 32

หน้าแรก: 868

หน้าสุดท้าย: 874

จำนวนหน้า: 7

นอก: 1877-7058

URL: https://www.scopus.com/inward/record.uri?eid=2-s2.0-84891755184&doi=10.1016%2fj.proeng.2012.02.025&partnerID=40&md5=4b7b6a9ca27b683bd40f2d67f019a5b9

ภาษา: English-Great Britain (EN-GB)

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บทคัดย่อ

In this study, chromium zirconium nitride (Cr-Zr-N) thin films have been prepared by reactive dc closed field unbalanced magnetron co-sputtering on Si (100) wafers and glass slides for 60 min without substrate heating and biasing voltage in gas mixture of Ar and N2 with flow rates kept constant at 3.0 sccm and 6.0 sccm, respectively. The sputtering currents applied to Zr target were varied from 0.2 A to 0.8 A, whereas the current of Cr target was kept at 0.8 A. To investigate films structure and surface morphology as a function of Zr content, the as-deposited films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM), and energy-dispersive X-ray spectroscopy (EDX). The results suggested that increasing in current applied to Zr target enhanced the deposition rate and also increased Zr content in the films ranging from 6.0 to 31.2 at %. The films formed a solid solution (Cr, Zr)N where Zr atoms substitute Cr atoms in the CrN lattice. The lattice parameters increased from 0.4207 nm to 0.4357 nm, whereas the grain sizes decreased from 11.27 nm to 7.412 nm. The film structure developed with the coexistence of (111) and (200) crystallographic orientation into a mixture of nanocrystalline grains as the sputtering currents of Zr target exceeded 0.2 A. The AFM images showed smoothing surface morphology with the roughness decreased from 9.471 nm to 2.437 nm. Cross-sectional micrographs exhibited the microstructure evolution corresponding to the grain refinement as a result of increasing Zr discharge current. ฉ 2010 Published by Elsevier Ltd.

คำสำคัญ

Solid Solution