Characterisation of C-F polymer film formation on the air-bearing surface etched sidewall of fluorine-based plasma interacting with AL2O 3-TiC substrate
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Author list: Limcharoen A., Limsuwan P., Pakpum C., Siangchaew K.
Publisher: Hindawi
Publication year: 2013
Journal: Journal of Nanomaterials (1687-4110)
Volume number: 2013
ISSN: 1687-4110
eISSN: 1687-4129
Languages: English-Great Britain (EN-GB)
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Abstract
C-F polymer redeposition is generated on the etched sidewall of the patterned air-bearing surface (ABS). This C-F polymer is a by-product from fluorine-based plasma using a Surface Technology Systems multiplex-pro air-bearing etch (ABE). The morphology of the re-deposition and the composite element was observed by a scanning electron microscope (SEM). The chemical bonding results were characterised via X-ray photoelectron spectroscopy, attenuated total reflected infrared spectroscopy and visible Raman spectroscopy. The purpose of this work is to demonstrate a modification of AlF3 re-deposition to C-F polymer re-deposition, which is easily stripped out by an isopropyl alcohol-based solution. The benefit of this research is the removal of the re-deposition in the resist strip process without additional cleaning process steps. ฉ 2013 Alonggot Limcharoen et al.
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