XPS and spectroscopic ellipsometry study of composite SiNx/DLC prepared by Co-deposition of RF magnetron and filtered cathodic arc
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Author list: Bunnak P., Gong Y.P., Limsuwan S., Pokaipisit A., Limsuwan P.
Publisher: Trans Tech Publications
Publication year: 2013
Journal: Advanced Materials Research (1022-6680)
Volume number: 712-715
Start page: 601
End page: 605
Number of pages: 5
ISBN: 9783037857243
ISSN: 1022-6680
eISSN: 1662-8985
Languages: English-Great Britain (EN-GB)
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Abstract
Composite SiNx/DLC films were deposited on silicon substrate by co-deposition system. The carbon plasma was generated by filtered cathodic arc source, simultaneously incorporated with silicon nitride from RF magnetron sputtering. The silicon nitride sputtering rate was maintained by fixed RF power at 100W while the arc current of FCA was varied from 20 to 80A.The SiNx/DLC film composition and optical properties were investigated by X-ray photoelectron spectroscopy and spectroscopic ellipsometry respectively. The results revealed that the atomic concentration of carbon increased while those of silicon and nitrogen decreased with increasing arc current. The oxidation was found on the film surface and related to the atomic concentration of silicon. The optical properties can be changed as a function of carbon concentration by setting different arc current. In this work, the volume percentage of carbon obtained from spectroscopic ellipsometry using Bruggeman EMA model showed good numerical correlation with the atomic percentage of carbon from XPS analysis with the range spanning across 75-95 at. %. ฉ (2013) Trans Tech Publications, Switzerland.
Keywords
Co-deposition, Ellipsometry, Filtered cathodic arc, RF magnetron
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