Surface chemical structure of poly(ethylene naphthalate) films during degradation in low-pressure high-frequency plasma treatments
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Author list: Kamata N., Yuji T., Thungsuk N., Arunrungrusmi S., Chansri P., Kinoshita H., Mungkung N.
Publisher: IOP Publishing
Publication year: 2018
Volume number: 57
Issue number: 6
ISSN: 0021-4922
eISSN: 1347-4065
Languages: English-Great Britain (EN-GB)
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Abstract
The surface chemical structure of poly(ethylene naphthalate) (PEN) films treated with a low-pressure, high-frequency plasma was investigated by storing in a box at room temperature to protect the PEN film surface from dust. The functional groups on the PEN film surface changed over time. The functional groups of –C=O, –COH, and –COOH were abundant in the Ar + O2 mixture gas plasma-treated PEN samples as compared with those in untreated PEN samples. The changes occurred rapidly after 2 d following the plasma treatment, reaching steady states 8 d after the treatment. Hydrophobicity had an inverse relationship with the concentration of these functional groups on the surface. Thus, the effect of the low-pressure high-frequency plasma treatment on PEN varies as a function of storage time. This means that radical oxygen and oxygen molecules are clearly generated in the plasma, and this is one index to confirm that radical reaction has definitely occurred between the gas and the PEN film surface with a low-pressure high-frequency plasma. © 2018 The Japan Society of Applied Physics.
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