Nanostructure optimization of Zr-W-Ti metallic glass thin films via multitarget co-sputtering with oblique angle deposition approach
บทความในวารสาร
ผู้เขียน/บรรณาธิการ
กลุ่มสาขาการวิจัยเชิงกลยุทธ์
รายละเอียดสำหรับงานพิมพ์
รายชื่อผู้แต่ง: Kowong R., Denchitcharoen S., Lertvanithphol T., Triamnak N., Chananonnawathorn C., Jaruwongrungsee K., Klamchuen A., Muthitamongkol P., Phae-ngam W., Nakajima H., Songsiriritthigul P., Horprathum M.
ผู้เผยแพร่: Elsevier
ปีที่เผยแพร่ (ค.ศ.): 2021
Volume number: 886
นอก: 0925-8388
eISSN: 1873-4669
ภาษา: English-Great Britain (EN-GB)
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บทคัดย่อ
In this work, we systematically investigated the Zr-W-Ti nanostructured metallic glasses (NMGs) thin films on silicon (Si) wafer substrate fabricated via multitarget co-sputtering with oblique angle deposition (OAD) technique. By varying the substrate angles (θs) from 0° to 55°, the evolution of Zr-W-Ti NMGs from dense to nanocolumnar and nanorod film were observed by field-emission scanning electron microscope (FE-FEM), which created by the self-shadowing effect. The critical point of substrate angles was around 15° to produce the nanocolumnar and 40° to form the nanorod structure. The relationship among the substrate angles and the Zr-W-Ti NMGs tilted angle (β) was determined and discussed in detail with two theoretical correlations as the “Tangent rule” and “Cosine rule.” The X-ray photoelectron spectroscopy (XPS) studied revealed the different chemical compositions. The results obtained from grazing incidence X-ray diffraction (GIXRD) and transmission electron microscope (TEM) indicated that the prepared Zr-W-Ti NMGs thin films exhibit an amorphous structure. Ultimately, it suggests that the multitarget co-sputtering with the OAD technique provides NMGs thin films, enabling applications in gas storage and sensor devices due to their well-defined nanostructured morphological and chemical composition characteristics. © 2021 Elsevier B.V.
คำสำคัญ
Multitarget co-sputtering, Nanostructured metallic glasses, Substrate angle, Zr-W-Ti