Development of Ar + O2 + Zn Powder Mixing Gas at Low-pressure High-frequency Plasma Chemical Vapor
Deposition Process System
Conference proceedings article
Authors/Editors
Strategic Research Themes
Publication Details
Author list: W. Poonthong, N. Mungkung, N. Kasayapanand, T. Yuji, T. Bouno, T. Haraguchi
Publication year: 2023
Start page: 115
End page: 116
Number of pages: 2
Languages: English-Great Britain (EN-GB)
Abstract
The chemical vapor deposition has been used to fabricate zinc oxide thin films on silicon substrates under argon + oxygen + mixing zinc powder gas on times deposition from 10 - 30 min. There have been found that the obtained samples presented the difference adhesion of thickness zinc oxide films on silicon substrates affecting to the electrical properties.
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