The study of RF-sputtering to create an amorphous titanium dioxide thin film increasing corrosion resistance

This research study explores the use of RF-sputtering to create amorphous titanium dioxide (TiO₂) thin films, with the aim of enhancing the corrosion resistance of aluminum substrates. The study involves varying sputtering conditions, including the choice of sputtering target (Ti or TiO₂), the gas environment (Ar or Ar+O₂) in the sputtering chamber, and post-sputtering annealing. The TiO₂ thin film surfaces were examined using scanning electron microscopy (SEM), elemental analysis was conducted through Energy Dispersive Spectroscopy (EDS), coating structure was analyzed using X-Ray diffraction analysis (XRD), and corrosion resistance was evaluated through a 24-hour salt spray test. The results indicate that sputtering with a Ti target in an Ar gas environment produces the maximum amount of TiO₂ film. Annealing at 200 °C reduces crystallinity and results in a more amorphous TiO₂ structure. Importantly, the salt spray test reveals no damage to the sputtered film in this condition. Therefore, the annealed film sputtered with a Ti target in an Ar gas environment demonstrates excellent corrosion resistance.