Temperature behavior of atmospheric-pressure non-equilibrium microwave discharge plasma jets for poly(ethylene naptharate)-surface processing

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Author listYuji T., Urayama T., Fujii S., Mungkung N., Akatsuka H.

PublisherElsevier

Publication year2008

JournalSurface and Coatings Technology (0257-8972)

Volume number202

Issue number22-23

Start page5289

End page5292

Number of pages4

ISSN0257-8972

eISSN1879-3347

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-50349098713&doi=10.1016%2fj.surfcoat.2008.06.056&partnerID=40&md5=cd235dbcca950987bd9cb58aa3555f24

LanguagesEnglish-Great Britain (EN-GB)


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Abstract

To understand the mechanism of surface processing using an atmospheric-pressure non-equilibrium microwave discharge plasma jet, we used optical emission spectroscopy to measure the vibrational and rotational temperatures of plasma. A microwave (2.45 GHz) power supply was used to excite the plasma. The vibrational and rotational temperatures in the plasma were measured at approximately 0.18 eV and 0.22 eV. We also conducted plasma surface processing of polyethylene naphthalate (PEN) film to measure changes in the water contact angle before and after the PEN film was processed, as well as while the rotational temperature of the plasma increased. The hydrophilicity of the PEN film surface was found to improve as the rotational temperature of the plasma increased.


Keywords

Microwave discharge plasma jetOptical emission spectroscopyPEN filmRotational temperatureVibrational temperature


Last updated on 2023-24-09 at 07:35