Determination of the optical constants and thickness of titanium oxide thin film by envelope method
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Publication Details
Author list: Witit-anun N., Rakkwamsuk P., Limsuwan P.
Publisher: Society of Photo-optical Instrumentation Engineers
Publication year: 2008
Volume number: 6793
ISBN: 9780819469588
ISSN: 0277-786X
eISSN: 1996-756X
Languages: English-Great Britain (EN-GB)
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Abstract
Transparent titanium oxide thin film was deposited by DC reactive magnetron sputtering method onto glass slides and silicon wafer substrates. The film was characterized by AFM, XRD and spectrophotometer for film's thickness, crystallographic structure and transmission spectrum respectively. The film's thickness was, from AFM, found to be about 296 nm. XRD measurement shows that the film is crystallized in rutile phase. Absorption coefficient and the thickness of the films were calculated from interference of transmittance spectra. Optical constants such as refractive index (n) and extinction coefficient (k) were determined as a function of wavelength over the wavelength range from 400 to 800 nm using envelope methods.
Keywords
Envelope method, Optical constants, Optical thin film, Reactive magnetron sputtering, Titanium oxide
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