Nanostructure of TiO2 thin films prepared by unbalanced magnetron sputtering
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Publication Details
Author list: Pokaipisit A., Chaiyakun S., Limsuwan P., Ngotawornchai B.
Publisher: World Scientific Publishing
Publication year: 2009
Journal: International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Atomic, Molecular and Optical Physics (0217-9792)
Volume number: 23
Issue number: 10
Start page: 2395
End page: 2403
Number of pages: 9
ISSN: 0217-9792
eISSN: 1793-6578
Languages: English-Great Britain (EN-GB)
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Abstract
In this study, titanium dioxide (TiO2) thin films were deposited on unheated glass substrates using an unbalanced magnetron sputtering system with different deposition times of 25, 35 and 45 min, respectively. The structure and surface morphology of TiO2 thin films were characterized by atomic force microscopy (AFM) and transmission electron microscopy (TEM) with selected-area electron diffraction (SAED). It was found that the crystallite size of TiO2 thin films was in the range of 10 - 20 nm, and the surface roughness was 1 - 3 nm. The SAED patterns show that the phase of TiO2 thin films obtained in this study is anatase phase. ฉ 2009 World Scientific Publishing Company.
Keywords
Oxide, Surface properties.
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