INFLUENCE OF CONTINUOUS AND DISCONTINUOUS DEPOSITIONS ON PROPERTIES OF ITO FILMS PREPARED BY DC MAGNETRON SPUTTERING

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Publication Details

Author list: Aiempanakit, K; Rakkwamsuk, P; Dumrongrattana, S

Publisher: World Scientific Publishing

Publication year: 2009

Journal: Modern Physics Letters B (0217-9849)

Volume number: 23

Issue number: 26

Start page: 3157

End page: 3170

Number of pages: 14

ISSN: 0217-9849

eISSN: 1793-6640

Languages: English-Great Britain (EN-GB)

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Abstract

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Keywords

Continuous deposition, DC magnetron sputtering, Discontinuous deposition, ITO, Target poisoning