Characterization of inhomogeneity in TiO2 thin films prepared by pulsed dc reactive magnetron sputtering
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Author list: Horprathum M., Eiamchai P., Chindaudom P., Nuntawong N., Patthanasettakul V., Limnonthakul P., Limsuwan P.
Publisher: Elsevier
Publication year: 2011
Journal: Thin Solid Films (0040-6090)
Volume number: 520
Issue number: 1
Start page: 272
End page: 279
Number of pages: 8
ISSN: 0040-6090
eISSN: 1879-2731
Languages: English-Great Britain (EN-GB)
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Abstract
This article discusses an analytical method for characterizations of TiO2 thin films and determinations of the degree of their inhomogeneity. The TiO2 films were prepared by a pulsed dc magnetron sputtering with an operating pressure as a main experimental parameter. The obtained films were primarily characterized for film crystallinity, microstructures and optical properties by spectroscopic ellipsometry. The measured ellipsometric data were analyzed by the single-, the double, and the triple-layer models in order to match with the inhomogeneous film structure proposed in the Thornton structure zone model. The results were then compared with those obtained from grazing-incidence X-ray diffraction, field-emission scanning electron microscopy and high-resolution transmission electron microscopy. The study revealed that the pulsed dc sputtered TiO2 films could be best described by the inhomogeneous triple-layer physical model. Although the films deposited at lower operating pressure had a dense structure with a mirror-like surface topography, the films deposited at higher operating pressure had the porous structure with the rough surface and the void. ฉ 2011 Elsevier B.V.
Keywords
Inhomogeneity, Spectroscopic ellipsometry, Transmission electron spectroscopy
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