Demonstration of modification from ALF3 re-deposition to polymer re-deposition on Air Bearing Surface (ABS) etched sidewall of fluorine-based plasma etch on Al2O3-TiC Substrate
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Publication Details
Author list: Pakpum C., Siangchaew K., Limsuwan P.
Publisher: Trans Tech Publications
Publication year: 2011
Volume number: 213
Start page: 93
End page: 97
Number of pages: 5
ISBN: 9783037850619
ISSN: 1022-6680
eISSN: 1662-8985
Languages: English-Great Britain (EN-GB)
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Abstract
In this work, C-F polymer rich re-deposition are generated on the etched side wall of the patterned Air Bearing Surface (ABS). This C-F rich polymer is a by product from using a Surface Technology Systems Multiplex-Pro Air Bearing Etch (ABE) tool that utilizes fluorine base plasma. The morphology of the re-deposition and elemental composition are investigated via scanning electron microscope. The chemical bonding information is characterized via attenuated total reflected infrared spectroscopy. The purpose of this work is to demonstrate the modification of AlF3 re-deposition to polymer rich re-deposition allows complete re-deposition removal with isopropyl alcohol base solution. This offers advantage as the re-deposition removal is incorporated during the resist strip process offering superior cleanliness of slider head without additional process steps. ฉ (2011) Trans Tech Publications.
Keywords
Fluorine base plasma, Polymer re-deposition, RIE etching