Oxygen partial pressure dependence of the properties of TiO2 thin films deposited by DC reactive magnetron sputtering
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Author list: Horprathum M., Eiamchai P., Chindaudom P., Pokaipisit A., Limsuwan P.
Publisher: Elsevier
Publication year: 2012
Volume number: 32
Start page: 676
End page: 682
Number of pages: 7
ISSN: 1877-7058
Languages: English-Great Britain (EN-GB)
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Abstract
Thin films of TiO2 have been deposited on glass and silicon wafers (100) substrates by DC reactive magnetron sputtering from a 99.995% pure titanium target. The influence of the oxygen partial pressure on the optical, crystallinity, surface morphology and UV-induced hydrophilic properties has been studied. The films were characterized by UV-VIS spectrophotometer, X-ray diffractometer, atomic force microscopy and scanning electron microscope. The UV-induced hydrophilicity of the films was measured by the contact angle variation. The results showed that the crystalline anatase, anatase/rutile or rutile films can be successfully deposited on unheated substrate. The best hydrophilicity was obtained on the well-crystallized anatase TiO2 thin film deposition with 5.0ื10-3 mbar oxygen partial pressure. The optical band gap of TiO2 thin films increased with increasing oxygen partial pressure, from 3.21 to 3.28 eV, with film thickness of 135 nm. ฉ 2010 Published by Elsevier Ltd.
Keywords
Hydrophilic, Oxygen partial pressure, Sputtering
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