The study on the effect of multi-level exposure technique to fabricate air bearing surface microstructure

Conference proceedings article

Authors/Editors

Strategic Research Themes

No matching items found.

Publication Details

Author list: Pholprasit P., Atthi N., Thammabut T., Jeamsaksiri W., Hruanun C., Poyai A., Silapunt R.

Publisher: Hindawi

Publication year: 2011

Start page: 26

End page: 29

Number of pages: 4

ISBN: 9781457704246

ISSN: 0146-9428

eISSN: 1745-4557

URL: https://www.scopus.com/inward/record.uri?eid=2-s2.0-79961218411&doi=10.1109%2fECTICON.2011.5947761&partnerID=40&md5=67f1ecc4c52fb9fbd1a255b9ae455ead

Languages: English-Great Britain (EN-GB)

View on publisher site

Abstract

Many photolithography and etching steps for a fabrication of an Air Bearing Surface (ABS) structure which is responsible for the aerodynamic behavior of a read/write head make a significant impact to HDDs overall cost. To reduce a cost/time consuming, the ABS can be fabricated by a technique called "multi-level exposure". This technique focuses on the exposure by changing the UV light intensity after moving the stage to a new position until all positions are completely exposed. The exposed wafer is then developed and etched in a single step to form 3 levels of the ABS structure. The relation between the remaining photoresist (PR) film thickness and the single- and the double-exposure dose can be calculated by using the exponential equations with 95.8% and 91.5% correlation, respectively. ฉ 2011 IEEE.

Keywords

3-D lithography, Air Bearing Surface, Hard disk drive, Multi-level exposure, Slider head