Effect of N 2 flow rate on structure and morphology of (Ti,Cr)N thin films deposited by unbalanced magnetron co-sputtering

Conference proceedings article

ผู้เขียน/บรรณาธิการ

กลุ่มสาขาการวิจัยเชิงกลยุทธ์

ไม่พบข้อมูลที่เกี่ยวข้อง

รายละเอียดสำหรับงานพิมพ์

รายชื่อผู้แต่ง: Paksunchai C., Denchitcharoen S., Chaiyakun S., Limsuwan P.

ผู้เผยแพร่: Trans Tech Publications

ปีที่เผยแพร่ (ค.ศ.): 2012

Volume number: 488-489

หน้าแรก: 432

หน้าสุดท้าย: 436

จำนวนหน้า: 5

ISBN: 9783037853825

นอก: 1022-6680

eISSN: 1662-8985

URL: https://www.scopus.com/inward/record.uri?eid=2-s2.0-84859096650&doi=10.4028%2fwww.scientific.net%2fAMR.488-489.432&partnerID=40&md5=2a7acf688d9f650c2716d733ca1fa16d

ภาษา: English-Great Britain (EN-GB)

ดูบนเว็บไซต์ของสำนักพิมพ์

บทคัดย่อ

The (Ti,Cr)N thin films were deposited with various N 2 flow rates on silicon wafers by reactive unbalanced magnetron co-sputtering without heating and biasing substrates. The effects of N 2 flow rate on the structure and morphologies of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM) and energy dispersive x-ray spectroscopy (EDS). The results revealed that the (Ti,Cr)N thin films formed solid solutions with the fcc structure. The crystallite sizes calculated from Scherrer formula are about 13 nm. The root-mean-square roughness (R rms) and the thickness (T th) of the films were slightly decreased with the increase in N 2 flow rate. The cross-sectional morphology showed columnar structure corresponding to zone 2. In addition, the N atomic concentration was also increased with the increase in N 2 flow rate. ฉ (2012) Trans Tech Publications.

คำสำคัญ

morphology, Structure, (Ti; Cr)N, Unbalanced magnetron co-sputtering