Influence of the substrate bias voltage on the structure of rutile TiO 2 films prepared by dual cathode DC unbalanced magnetron sputtering
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Publication Details
Author list: Kasemanankul P., Witit-Anun N., Chaiyakun S., Limsuwan P.
Publisher: Trans Tech Publications
Publication year: 2012
Volume number: 506
Start page: 82
End page: 85
Number of pages: 4
ISBN: 9783037854068
ISSN: 1022-6680
eISSN: 1662-8985
Languages: English-Great Britain (EN-GB)
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Abstract
Rutile TiO 2 films are normally used as biomaterial that synthesized on unheated stainless steel type 316L and glass slide substrates by dual cathode DC unbalanced magnetron sputtering. The influence of the substrate bias voltages (V SB), from 0 V to -150V, on the structure of the as-deposited films was investigated. The crystal structure was characterized by grazing-incidence X-ray diffraction (GIXRD) technique, the film's thickness and surface morphology was evaluated by atomic force microscopy (AFM) technique, respectively. The results show that the as-deposited films were transparent and have high transmittance in visible regions. The crystal structure of as-deposited films show the XRD patterns of rutile (110) with V SB at 0V and shifted to rutile (101) with increasing V SB. The films roughness (R RMS) and the thickness were 3.0 nm to 5.7 nm and 420 nm to 442 nm, respectively. ฉ (2012) Trans Tech Publications.
Keywords
Rutile, Substrate bias voltage, Thin film
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