Electrical properties of bi-layered nanostructured au/indium tin oxide thin films

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Author listJutarosaga T., Suapadkron P., Tuayjareon R., Luangchaisri C., Dumrongrattana S.

Publication year2014

JournalKasetsart Journal - Natural Science (0075-5192)

Volume number48

Issue number5

Start page815

End page822

Number of pages8

ISSN0075-5192

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-84923654921&partnerID=40&md5=dd118838fdb1456a9ea5cffe66909c3c

LanguagesEnglish-Great Britain (EN-GB)


Abstract

Au thin films were deposited on 150-nm thick indium tin oxide (ITO)/glass using a simple direct current sputtering technique. The Au thickness was varied from approximately 8 nm to 34 nm. Asdeposited bi-layered Au/ITO thin films were then characterized using a four-point probe technique and Hall measurement to identify their electrical properties. The results showed that there was a substantial contribution from the Au films on the electrical conductivity of the bi-layered material, even when a discontinuous Au nanostructure was observed on the ITO films. A simple circuit model was developed to identify the electrical behavior of this bi-layered material. The increase in the carrier concentration and the reduction in carrier mobility was possibly a result of the interfaces between the Au islands and the ITO film. ฉ 2014 Kasetsart J. (Nat. Sci.) All rights received.


Keywords

Bi-layered thin filmsElectrical resistivityFour-point probeMetallic thin films


Last updated on 2022-06-01 at 16:03