Laser-induced fluorescence detection of OH radicals generated by atmospheric-pressure nonequilibrium DC pulse discharge plasma jets

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Author list: Yuji T., Mungkung N., Kawano H., Kanazawa S., Ohkubo T., Akatsuka H.

Publisher: Institute of Electrical and Electronics Engineers

Publication year: 2014

Journal: IEEE Transactions on Plasma Science (0093-3813)

Volume number: 42

Issue number: 4

Start page: 960

End page: 964

Number of pages: 5

ISSN: 0093-3813

eISSN: 1939-9375

URL: https://www.scopus.com/inward/record.uri?eid=2-s2.0-84898822301&doi=10.1109%2fTPS.2014.2306199&partnerID=40&md5=8d35245c0a01c0505b10567ac2ef3201

Languages: English-Great Britain (EN-GB)

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Abstract

It has been proven that many types of radicals released from atmospheric-pressure plasma can provide effective surface treatment and modification of materials. However, the method for measuring radicals generated with atmospheric-pressure plasma and their reaction mechanisms have not become clear in material surface processing. The OH radical distribution was measured successfully in nonequilibrium atmospheric-pressure dc pulse discharge plasma jet by use of the laser-induced fluorescence system. The OH transition A 2Σ+v′=1 X2Π (v′′=0] at 282 nm was used to monitor the ground-state OH radicals. © 2014 IEEE.

Keywords

Argon gas, atmospheric-pressure plasma, dc pulse discharge, laser-induced fluorescence (LIF), OH radical.