Low-Temperature naturatron sputtering system for deposition of indium tin oxide film
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Author list: Thungsuk N., Yuji T., Kasayapanand N., Mungkung N., Nuachauy P., Arunrungrusmi S., Nakabayashi K., Okamura Y., Kinoshita H., Kataoka H., Suzaki Y., Hirata T.
Publisher: Institute of Electrical and Electronics Engineers
Publication year: 2014
Journal: IEEE Transactions on Plasma Science (0093-3813)
Volume number: 42
Issue number: 10
Start page: 3391
End page: 3396
Number of pages: 6
ISSN: 0093-3813
eISSN: 1939-9375
Languages: English-Great Britain (EN-GB)
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Abstract
In this paper, we have newly developed a metal thin film-forming sputtering system using the Naturatron Sputtering method that can prevent the plastic film from suffering damage caused by the high-energy particles in plasma and carry out the low-temperature high-density metal deposition with a sputtering chamber and a film deposition chamber separated from each other. This system has made it possible to deposit the indium tin oxide (ITO) thin film on the poly(ethylene naphthalate) film as a substrate. As a result of energy-dispersive X-ray spectroscopy analysis or scanning electron microscope analysis performed for the ITO thin film, it has been proven that the uniform-surface ITO thin film can be deposited on a plastic film. ฉ 2014 IEEE.
Keywords
indium tin films, Naturatron Sputtering method, poly(ethylene naphthalate) (PEN) film
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