Kinetic removal of haloacetonitrile precursors by photo-based advanced oxidation processes (UV/H2O2, UV/O3, and UV/H2O2/O3)
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Publication Details
Author list: Srithep S., Phattarapattamawong S.
Publisher: Elsevier
Publication year: 2017
Journal: Chemosphere (0045-6535)
Volume number: 176
Start page: 25
End page: 31
Number of pages: 7
ISSN: 0045-6535
Languages: English-Great Britain (EN-GB)
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Abstract
The objective of the study is to evaluate the performance of conventional treatment process (i.e., coagulation, flocculation, sedimentation and sand filtration) on the removals of haloacetonitrile (HAN) precursors. In addition, the removals of HAN precursors by photo-based advanced oxidation processes (Photo-AOPs) (i.e., UV/H2O2, UV/O3, and UV/H2O2/O3) are investigated. The conventional treatment process was ineffective to remove HAN precursors. Among Photo-AOPs, the UV/H2O2/O3was the most effective process for removing HAN precursors, followed by UV/H2O2, and UV/O3, respectively. For 20min contact time, the UV/H2O2/O3, UV/H2O2, and UV/O3suppressed the HAN formations by 54, 42, and 27% reduction. Increasing ozone doses from 1 to 5 mgL−1in UV/O3systems slightly improved the removals of HAN precursors. Changes in pH (6–8) were unaffected most of processes (i.e., UV, UV/H2O2, and UV/H2O2/O3), except for the UV/O3system that its efficiency was low in the weak acid condition. The pseudo first-order kinetic constant for removals of dichloroacetonitrile precursors (k′DCANFP) by the UV/H2O2/O3, UV/H2O2and standalone UV systems were 1.4–2.8 orders magnitude higher than the UV/O3process. The kinetic degradation of dissolved organic nitrogen (DON) tended to be higher than the k′DCANFPvalue. This study firstly differentiates the kinetic degradation between DON and HAN precursors. © 2017 Elsevier Ltd
Keywords
Advanced oxidation process (AOPs), Dissolved organic nitrogen (DON), Haloacetonitriles, Nitrogenous disinfection byproducts (N-DBPs)
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